节点文献

AZO热压靶材的制备及性能表征研究

Preparation and Characterization of Hotpressing AZO Sputter Target

  • 推荐 CAJ下载
  • PDF下载
  • 不支持迅雷等下载工具,请取消加速工具后下载。

【作者】 王星明白雪段华英孙静卢世刚黄松涛

【Author】 Wang Xingming,Bai Xue,Duan Huaying,Sun Jing,Lu Shigang,Huang Songtao(Department of Mineral Resource & Metallurgical Materials,General Research Institute for Non-Ferrous Metals,Beijing 100088,China)

【机构】 北京有色金属研究总院矿物资源与冶金材料研究所

【摘要】 以化学组成ZnO∶A l2O3=98∶2%的混合粉体为原料,采用热压烧结制备AZO靶材。研究了热压工艺条件对靶材致密化的影响。结果表明,热压温度与压力上升,靶材致密度增大;在AZO靶材的致密化过程中存在"反致密化"现象,这是由于连通气孔的合并与生长及闭合气孔率的升高引起的。在实验条件范围内,在热压工艺条件压力18 MPa、温度1150℃、保温保压时间90 m in下,制备了AZO靶材。通过SEM观察热压靶材的断面形貌,阿基米德法测量靶材密度,水银压汞仪测量靶材的平均孔径及孔径分布,XRD测定靶材相结构,四探针测定电阻率等方法对AZO靶材的性能进行了分析表征,结果表明:结构为六方纤锌矿,密度为5.39.gcm-3,靶材连通气孔率为0.05%,闭合气孔率为3.4%,电阻率为5.3×10-4Ω.cm。采用射频溅射制备AZO薄膜,对靶材的使用性能及AZO薄膜性能进行了分析,表明靶材使用寿命大于150 W.h,薄膜在可见波段的平均透过率达到85.5%,电阻率达到3.1×10-4Ω.cm,满足薄膜太阳能对透明导电薄膜性能的要求。

【Abstract】 AZO targets were prepared by hot-pressing using ZnO and Al2O3 mixture in composition of 98∶ 2%.The effects of hot pressing conditions on the relative density were studied.The results revealed that the target density increased with increase of the temperature and pressure.But with the increase of the preserving time,there existed a phenomena of "anti-densification",which was contributed to growth of the channel pores and the increase of the volume content of the isolated pores.Among designed experiments,an AZO sputter target was hot pressed with pressure of 18 MPa,temperature of 1150 ℃ and preserving time of 90 min.The fracture morphology was observed by SEM photograph,and the density of target was measured using Archimedes method.The channel pore size and the volume content of the channel and isolated pores were measured by mercury intrusion porosimeter,and the phase structure of target was analyzed by X-ray diffractometer with a monochromated Cu Kα X-ray source.Specifications were as following: the phase structure was Wurtzite,the density was 5.39 g · cm-3,the volume content of channel pores was 0.05%,the volume content of isolated pores was 3.4%,the resistivity was 5.3×10-4 Ω · cm,and target life was longer than 150 W · h.AZO thin film was deposited by radiofrequency sputtering.The analysis showed that the average transmittance of AZO film was up to 85.5%,and the resistivity was 3.1×10-4 Ω · cm,both met the needs of the transparent conductive oxide film for solar cell application.

【关键词】 AZO靶材热压溅射薄膜太阳能
【Key words】 AZOsputter targethot-pressingsputteringthin film solar cell
【基金】 国家科技部技术开发基金(31001)资助项目
  • 【文献出处】 稀有金属 ,Chinese Journal of Rare Metals , 编辑部邮箱 ,2011年03期
  • 【分类号】TF124.5
  • 【被引频次】16
  • 【下载频次】515
节点文献中: 

本文链接的文献网络图示:

本文的引文网络