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纳米锐钛矿型TiO2薄膜的制备及分析
Preparation and Analysis of Nano-Crystallite Anatase Phase TiO2 Thin Films
【摘要】 采用反应磁控溅射法在玻璃衬底上制备锐钛矿相TiO2薄膜,研究了工艺条件中的氧氩流量比对薄膜润湿角的影响以及溅射气压对薄膜微观结构的影响。对不同氧氩流量比(分别为1/40,1/20,1/10和1/5)时制备的TiO2薄膜进行润湿角测量,润湿角照片显明:氧氩比1/5时薄膜润湿角可减小到8°左右,即提高氧氩比能增强TiO2薄膜的自洁净性能。X射线衍射(XRD)分析表明:当溅射气压降到1.0 Pa时,可以得到锐钛矿型TiO2薄膜晶体,0.5 Pa时的XRD图衍射峰更为明显。用分光光度计测量了TiO2薄膜的紫外吸收光谱,由光谱曲线上光吸收阈值与半导体带隙之间的关系计算出了TiO2薄膜的禁带宽度为3.42 eV,表明TiO2薄膜的吸收边出现了一定的蓝移。根据XRD图谱计算TiO2薄膜的晶粒尺寸,得到的薄膜晶粒尺寸在十几纳米左右,由此说明了TiO2薄膜吸收边发生蓝移的原因;按照锐钛矿相TiO2薄膜XRD图25.3°衍射峰对应的(101)晶面,由Bragg方程计算出其晶面间距为0.3521 nm,表明TiO2薄膜晶体发生了一定的晶格畸变。
【Abstract】 The anatase phase TiO2 thin films were prepared on the glass substrates by DC reactive magnetron sputtering method.The influence of technological condition,such as the O2/Ar flow ratio,on contact angle of the films and the sputtering pressure on the microstructure of the films,was studied respectively.The contact angle of TiO2 films prepared in different O2/Ar flow ratio(1/40,1/20,1/10 and 1/5) were measured respectively.The contact angle photograph showed that the film contact angle could be reduced to 8° or so when the O2/Ar ratio was 1/5,this meant that the self-clean property of TiO2 films could be enhanced by increasing O2/Ar ratio.Analysis of X-ray diffraction(XRD) showed that the crystal of anatase phase TiO2 films could be obtained when the sputtering pressure was decreased to 1.0 Pa,the diffraction peak of XRD spectrum was more prominent when the sputtering pressure was 0.5 Pa.The ultraviolet absorption spectrum of TiO2 films was measured by spectrophotometer;the energy gap of the TiO2 films of 3.42 eV was calculated according to the relation of the absorption threshold in the spectrum curve and the semiconductor energy gap.The result showed that the absorption band of TiO2 films had a little blue shift.The crystallite size of the TiO2 films was calculated by XRD spectrum,the crystallite size of more than ten nanometers was obtained,and that was the reason of the absorption band blue shift of the TiO2 films.In the XRD pattern of anatase phase TiO2,for films with 25.3° diffraction peak corresponding(101) lattice plane,the crystal face gap of 0.3521 nm was also calculated by Bragg equation.The results showed that a little lattice distortion of the TiO2 films crystal existed.
【Key words】 magnetron sputtering; TiO2 thin films; contact angle; energy gap;
- 【文献出处】 稀有金属 ,Chinese Journal of Rare Metals , 编辑部邮箱 ,2011年02期
- 【分类号】O614.411
- 【被引频次】18
- 【下载频次】840