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Open-circuit voltage analysis of p-i-n type amorphous silicon solar cells deposited at low temperature

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【作者】 倪牮张建军曹宇王先宝李超陈新亮耿新华赵颖

【Author】 Ni Jian,Zhang Jian-Jun,Cao Yu,Wang Xian-Bao,Li Chao,Chen Xin-Liang,Geng Xin-Hua,and Zhao Ying Institute of Photo-electronics Thin Film Devices and Technique of Nankai University,Key Laboratory of Photo-electronics Thin Film Devices and Technique of Tianjin,Key Laboratory of Photo-electronic Information Science and Technology of Ministry of Education (Nankai University),Tianjin 300071,China

【机构】 Institute of Photo-electronics Thin Film Devices and Technique of Nankai University,Key Laboratory of Photo-electronics Thin Film Devices and Technique of Tianjin,Key Laboratory of Photo-electronic Information Science and Technology of Ministry of Education (Nankai University)

【摘要】 This paper identifies the contributions of p-a-SiC:H layers and i-a-Si:H layers to the open circuit voltage of p-i-n type a-Si:H solar cells deposited at a low temperature of 125 C.We find that poor quality p-a-SiC:H films under regular conditions lead to a restriction of open circuit voltage although the band gap of the i-layer varies widely.A significant improvement in open circuit voltage has been obtained by using high quality p-a-SiC:H films optimized at the "low-power regime" under low silane flow rates and high hydrogen dilution conditions.

【Abstract】 This paper identifies the contributions of p-a-SiC:H layers and i-a-Si:H layers to the open circuit voltage of p-i-n type a-Si:H solar cells deposited at a low temperature of 125 C.We find that poor quality p-a-SiC:H films under regular conditions lead to a restriction of open circuit voltage although the band gap of the i-layer varies widely.A significant improvement in open circuit voltage has been obtained by using high quality p-a-SiC:H films optimized at the "low-power regime" under low silane flow rates and high hydrogen dilution conditions.

【基金】 Project supported by the National High Technology Research and Development Program of China (Grant No. 2009AA05Z422);the National Basic Research Program of China (Grant Nos. 2011CBA00705,2011CBA00706,and 2011CBA00707);the Natural Science Foundation of Tianjin (Grant No. 08JCZDJC22200)
  • 【文献出处】 Chinese Physics B ,中国物理B , 编辑部邮箱 ,2011年08期
  • 【分类号】TM914.4
  • 【被引频次】1
  • 【下载频次】47
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