Unidirectional expansion of lattice parameters in GaN induced by ion implantation

【摘要】 This paper reports that the 150-keV Mn ions are implanted into GaN thin film grown on Al2O3 by metal-organic chemical vapour deposition.The X-ray diffraction reciprocal spacing mapping is applied to study the lattice parameter variation upon implantation and post-annealing.After implantation,a significant expansion is observed in the perpendicular direction.The lattice strain in perpendicular direction strongly depends on ion fluence and implantation geometry and can be partially relaxed by post-annealing.While in the parallel direction,the lattice parameter approximately keeps the same as the unimplanted GaN,which is independent of ion fluence,implantation geometry and post-annealing temperature.更多还原

【Abstract】 This paper reports that the 150-keV Mn ions are implanted into GaN thin film grown on Al2O3 by metal-organic chemical vapour deposition.The X-ray diffraction reciprocal spacing mapping is applied to study the lattice parameter variation upon implantation and post-annealing.After implantation,a significant expansion is observed in the perpendicular direction.The lattice strain in perpendicular direction strongly depends on ion fluence and implantation geometry and can be partially relaxed by post-annealing.While in the parallel direction,the lattice parameter approximately keeps the same as the unimplanted GaN,which is independent of ion fluence,implantation geometry and post-annealing temperature.更多还原