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高速生长CVD金刚石单晶及应用
High-rate growth of CVD single-crystal diamond and its application
【摘要】 文章简要地介绍了近年来国内外CVD金刚石单晶的高速生长和应用进展。实验中采用微波等离子体化学气相沉积(CVD)方法,同质外延高速生长金刚石单晶,通过改变反应腔压强、反应气氛(在CH4/H2中引入氮气N2、二氧化碳CO2、氧气O2、)等,调制单晶生长速率、质量、颜色、表面粗糙度、光谱等特性。利用高温氢等离子体进行退火,可使金刚石单晶的颜色有很大的改善。研制了CVD金刚石单晶刀具,用于金属材料的曲面镜面加工。
【Abstract】 In this paper,we briefly review the resent great improvements achieved for the high rate growth and applications of CVD single-crystal diamonds(SCDs).We have investigated the high rate homoepitaxial growth of SCDs dependent on reaction pressure,atmosphere(introducing the gaseous N2,O2,CO2 in H2/CH4) by microwave plasma CVD.The growth rate,the quality,color,surface roughness,and photoluminescence properties are efficiently controlled.Annealing by hydrogen plasma,the color of the SCDs has been great improved.We developed a CVD SCD cutter using for the curved mirror face polishing of metallic material.
【Key words】 high-rate growth; CVD; single-crystal diamond; annealing; diamond cutter;
- 【文献出处】 超硬材料工程 ,Superhard Material Engineering , 编辑部邮箱 ,2011年02期
- 【分类号】TQ164
- 【被引频次】26
- 【下载频次】706