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纳米尺度MOSFET过剩噪声的定性分析
Qualitative analysis of excess noise in nanoscale MOSFET
【摘要】 最近实验表明纳米尺度MOSFET中的过剩噪声主要为散粒噪声,而此前研究认为MOSFET中不存在散粒噪声,短沟道MOSFET中的过剩噪声为热噪声.本文基于器件电流模型分析散粒噪声取代热噪声成为过剩噪声主要成分的转变条件,根据该条件对纳米尺度MOSFET噪声特性的预测与文献报道的实验现象、模拟结果以及介观散粒噪声相关结论相符合.
【Abstract】 Recent experiment indicates that shot noise is the dominant excess noise in nanoscale MOSFET.However the early research reported that no shot noise was observed in MOSFET,and thermal noise was the excess noise in short channel MOSFET.Based on the device current model,we derive the conversion conditions for the dominant component of excess noise shifting from thermal noise to shot noise.According to the conversion conditions,the prediction of the noise performance of nanoscale MOSFET is given,and the results coincide with experimental phenomena,simulation data and conclusion of mesoscopic shot noise,which has been reported in the article.
- 【文献出处】 物理学报 ,Acta Physica Sinica , 编辑部邮箱 ,2011年10期
- 【分类号】TN386
- 【被引频次】9
- 【下载频次】91