【摘要】 通过对电沉积法得到的Ni-Cu合金镀层进行电化学去合金化处理,制备了纳米多孔结构金属镍膜.采用循环伏安法对多孔金属镍膜在1mo·lL-1KOH溶液中进行阳极氧化处理,获得了纳米多孔结构的镍基复合膜电极.应用扫描电子显微镜(SEM)、X射线衍射(XRD)、X射线光电子能谱(XPS)和电化学技术对所制备的膜电极的物理性质及赝电容特性进行了表征.SEM、XRD和XPS的测试结果表明,所制备的纳米多孔结构镍基复合57膜8F由·gN-i1、的N初i(O始H比)2和电N容iO;在OH1组00成0次.电充化放学电实循验环结后果,它显的示比,该电复容合值膜为在54240F·A·gg-1-,1的电充容保放持电率电为流密94度%下.纳,给米出多孔了结构有利于KOH电解液的渗透,从而促进反应物种在电极内部的传输;纳米多孔的金属镍基体可以提高Ni(OH)2膜的电子导电性;纳米大小的Ni(OH)2颗粒能够缩短质子的固相扩散路径.上述因素是所制备的纳米多孔结构镍基复合膜电极具有优异赝电容特性的主要原因.更多还原

【Abstract】 A porous nickel film was prepared by the selective anodic dissolution of copper from an electrodeposited Ni-Cu alloy film. A porous nanostructured nickel-based complex film electrode was further fabricated by oxidizing the obtained porous nickel film using cyclic voltammetry in 1 mol·L-1 KOH solution. The physical properties and pseudocapacitive performance of the as-prepared film electrodes were investigated by scanning electron microscopy (SEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and electrochemical techniques. The results of SEM, XRD, and XPS indicate that the obtained complex film electrode consists of Ni, Ni(OH)2, and NiOOH, and it has a porous nanostructure. The electrochemical experiments revealed that the as-prepared porous nanostructured nickel-based complex film electrode had a specific capacitance of 578 F·g-1 at a current density of 20 A·g-1 at the initial cycle and it gave a specific capacitance of 544 F·g-1 after 1000 cycles with a capacitance retention of 94%. The nanoporous structure enhances the accessibility of the KOH electrolyte and promotes reactive species transport within the electrode. The nanoporous Ni substrate may improve the electronic conductivity of the thin Ni(OH)2 film at its surfaces. The nanosized Ni(OH)2 grains can shorten the proton diffusion pathways in the bulk of the solid nickel hydroxide. These factors are responsible for the superior pseudocapacitive performance of the porous nanostructured nickel-based complex film electrode.更多还原