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Mo-SiO2太阳选择性吸收涂层的空气高温热稳定性

THERMAL STABILITY OF Mo-SiO2 SOLAR SELECTIVE COATINGS AT HIGH TEMPERATURES IN AIR

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【作者】 魏其睿王健李德杰殷志强

【Author】 Wei Qirui,Wang Jian,Li Dejie,Yin Zhiqiang (Department of Electronic Engineering,Tsinghua University,Beijing 100084,China)

【机构】 清华大学电子工程系

【摘要】 采用磁控溅射的方法制作Mo-SiO2太阳能选择性吸收涂层,测量了涂层经过空气高温退火前后在0.34~25μm波长范围内反射曲线的变化情况。刚沉积完的涂层,太阳吸收比达到0.95,发射比为0.093。在空气中500、600℃退火1h后,涂层反射曲线基本不变。在空气中700℃退火1h后,涂层光谱选择性恶化,太阳吸收比下降到0.91,发射比上升到0.6。通过扫描电子显微镜观察了单层Mo、单层SiO2以及SiO2覆盖Mo的样片薄膜在空气中不同温度退火前后的形貌变化,发现以上薄膜表面不再平整,甚至出现裂纹和薄膜脱落,成为Mo-SiO2选择性吸收特性恶化的主要原因。

【Abstract】 Mo-SiO2 multilayer solar selective coatings were deposited by magnetron sputtering technique.The samples were annealed in atmosphere at different temperatures ranging from 500℃ to 700℃ for 1hour.The reflectance in the wavelength region of 0.34-25μm of the as-deposited and annealed samples were measured with UV-VIS-NIR and FT-IR spectrometers.The solar absorptance(α)and thermal emittance(ε)of as-deposited coatings were 0.95 and 0.093,respectively.The reflectance was nearly the same after anneal in air at 500℃ and 600℃ for 1hour.The spectra selectivity of coating deteriorated after annealing in air at 700℃ for 1hour,whose α and ε were changed to 0.91 and 0.6,respectively.Then Mo,SiO2 single layer and Mo/SiO2 tandem layers were deposited with the same process and annealed in air at different temperatures for 1 hour.The surface morphology of as-deposited and annealed films were investigated with scanning electronic microscopy.The annealed films became rough, and cracks and peelings appeared,and was the main reason of spectra selectivity deterioration.

【基金】 国家自然科学基金(50706022);国家高技术研究发展(863)计划(2007AA05Z429)
  • 【文献出处】 太阳能学报 ,Acta Energiae Solaris Sinica , 编辑部邮箱 ,2011年08期
  • 【分类号】TK512
  • 【被引频次】27
  • 【下载频次】275
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