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多孔Cu2O/SnO2复合薄膜的制备及其可见光催化降解罗丹明B的性能
Preparation of Porous Cu2O/SnO2 Compound Films for Visible Light Degradation of Rhodamine B
【摘要】 采用浸渍-沉积方法在电沉积的多孔Cu薄膜上修饰一层纳米SnO2,经低温热氧化处理制备出多孔Cu2O/SnO2复合多层薄膜。运用扫描电子显微镜(SEM)、透射电子显微镜(TEM)、X-射线粉末衍射仪(XRD)、紫外可见漫反射光谱(UV-vis DRS)和荧光光谱(FS)技术表征了薄膜的结构、形貌和光学性质。测试了薄膜在可见光下降解罗丹明B(RhB)的性能。结果表明,在30℃的0.2 mol/L CuSO4+1.5 mol/L H2SO4镀液中,以1.5 A/cm2电流沉积20 s得到的多孔Cu薄膜,在SnO2溶胶中浸渍10 s并重复5次,再经空气气氛下100℃焙烧30 min,制得的多孔复合薄膜显示良好的可见光催化降解RhB的性能。
【Abstract】 The dip-deposited method was used to coat the self-made SnO2 sol on the porous Cu films electrodeposited.And the porous Cu2O/ SnO2 films were prepared by heated the films in air.The porous films were characterized with scanning electron microscopy(SEM)Transmission Electron Microscope(TEM),X-ray diffractometry(XRD),UV-vis diffuse reflectance spectroscopic(UV-vis DRS)and Fluorescence Spectrometer(FS).The photocatalytic performance of porous Cu2O/SnO2 films were tested through photodegradation of rhodamine B illuminated with visible light.The results reveal that the porous films shown excellent activity of visible light photocatalytic degradation of rhodamine B.And the optimal condition for preparation of the Cu2O/SnO2 films are that the porous Cu films electrodeposited in a solution containing 0.2 mol/L CuSO4,1.5 mol/L H2SO4 at 30℃,and at 1.5 A/cm2 for 20 s,then diped in the self-made SnO2 sol for 10s and 5 times repeatedly, follow by heated at 100℃ for 30 min in air.
【Key words】 Cu2O-SnO2; porous films; electrodeposition; photodegradation; rhodamine B;
- 【文献出处】 世界科技研究与发展 ,World Sci-Tech R$D , 编辑部邮箱 ,2011年05期
- 【分类号】O643.36
- 【被引频次】2
- 【下载频次】95