【摘要】 本文基于脉冲激光沉积(PLD)方法及热退火处理方式,利用输出波长为1064 nm的Nd:YAG脉冲激光器在P型Si(100)衬底上生长了均匀的单相β-FeSi2薄膜。采用X射线衍射(XRD)、扫描电镜(SEM)、原子力显微镜(AFM)分析技术,研究了β-FeSi2薄膜的结构、组分、结晶质量和表面形貌。结果发现,在其他相同沉积条件下,随着溅射时间的增加,薄膜晶化程度、颗粒大小和形状、表面粗糙度都发生规律性变化,通过分析比较得出,在本实验条件下溅射时间为40 min制备的β-FeSi2薄膜结晶质量较好。更多还原

【Abstract】 We made uniform single phase β-FeSi2 films on Si(100) substrate with a Nd:YAG pulsed laser of 1064 nm(output wavelength),pulsed laser deposition(PLD) and thermal annealing process.We further investigated the structure and surface morphology with atomic force microscope(AFM),scanning electron microscope(SEM) and X-ray diffraction(XRD) method.Experimental results show the crystallization degree,size and shape of the grains and surface roughness are all regularly changed with the increase of sputtering time.We discovered that 40 minutes is the optimal sputtering time under the present experimental conditions after comparing the different sputtering time.更多还原