【摘要】 研制了一台实用型放电泵浦的351 nm XeF(B-X)准分子激光器,激光器采用新型开关电源、结构紧凑型张氏电极及放电火花预电离的激光腔结构,通过优化储能电容和放电电容量及比值,选取合理的工作气体压力和配比,优化了激光器性能,提高了激光器输出参数:单脉冲能量153 mJ,平均功率12.9 W,转换效率最高达到0.88%,重复频率1～80 Hz,能量不稳定度小于4%,近场光斑尺寸7 mm×22 mm。激光器已应用到常规抗蚀剂曝光的印刷电路板(PCB)激光投影成像照明系统的实验中。更多还原

【Abstract】 A discharge-pumped 351 nm XeF(B-X) excimer laser has been developed.For improving output efficiency and energy and achieving stationary discharge,the laser adopted a new switching power supply,compact Chang’s electrodes and spark preionization structure,and the optimization of storage/discharge capacitances and working gas mixture was performed.The maximum laser efficiency of the laser is 0.88%.When the laser works at 30 kV with the maximum repetition rate of 80 Hz,the output energy is about 153 mJ/pulse,the average power is 12.9 W,the pulse-to-pulse energy stability is no more than 4%,and the beam dimensions are 7 mm×22 mm near the output window.The laser has been applied to the experiments of the printed circuit board(PCB) lithography system based on resist exposure.更多还原