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JFET区注入对大功率VDMOS击穿电压和导通电阻的影响

Effect of Ion-Implanted JFET Region on Breakdown Voltage and On-Resistance of Power VDMOS Device

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【作者】 万欣周伟松刘道广许军

【Author】 WAN Xin1,ZHOU Weisong1,LIU Daoguang1,XU Jun2(1.Power Electronics Division,Institute of Nuclear and New Energy Technology,Tsinghua University,Beijing 100084,P.R.China; 2.Institute of Microelectronics,Tsinghua University,Beijing 100084,P.R.China)

【机构】 清华大学核能与新能源技术研究院功率电子技术研究室清华大学微电子学研究所

【摘要】 研究了JFET区注入对大功率VDMOS器件击穿电压和导通电阻的影响,分析讨论了JFET区注入影响击穿电压的机理,并定量给出JFET区注入对导通电阻的影响。通过器件数值模拟优化JFET区注入剂量,并根据仿真结果改进器件设计,在满足击穿电压要求的前提下导通电阻降低了8%。

【Abstract】 Effect of ion-implanted JFET region on breakdown voltage and on-resistance of power VDMOS device was investigated.Mechanism of breakdown voltage drop induced by implantation into JFET region was discussed,and effect of implantation in JFET region on on-resistance was quantitatively analyzed.By optimizing implantation dosage with TCAD and modifying device design according to simulation results,on-resistance of the device was reduced by 8%,and breakdown voltage didn’t drop significantly.

【关键词】 JFETVDMOS击穿电压导通电阻
【Key words】 JFETVDMOSBreakdown voltageOn-resistance
【基金】 国家自然科学基金资助项目(60820106001)
  • 【分类号】TN386
  • 【被引频次】7
  • 【下载频次】313
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