节点文献
高纯二氧化硅制备的研究
STUDY ON PREPARATION OF HIGH-PURITY SILICON DIOXIDE
【摘要】 本文介绍了国内外制备高纯二氧化硅的现状,研究了在硅石制取高纯二氧化硅过程中,压力与温度对硅石浸出过程的影响,酸种类和螯合剂对产品纯度的影响,以及酸度、陈化条件对二氧化硅粒度的影响。实验表明:在最佳工艺条件下,可制得纯度为99.9604%,平均粒度为18.37μm的二氧化硅。
【Abstract】 This paper introduces the current situation of high-purity silicon dioxide preparation at home and abroad,and studies the impact of pressure & temperature on silica leaching process,impact of acid & chelating agent on product purity,and impact of acidity & aging condition to silicon dioxide particle size.The results shows that under best process condition,silicon dioxide with purity of 99.9604% and average particle size of 18.37μm can be prepared.
- 【文献出处】 矿冶 ,Mining and Metallurgy , 编辑部邮箱 ,2011年03期
- 【分类号】TQ127.2
- 【被引频次】7
- 【下载频次】570