【摘要】 采用无机盐溶胶-凝胶方法在载玻片衬底上制备了ZnO:Al薄膜,利用X射线衍射(XRD)、紫外-可见光透射光谱(UV-Vis transmittance spectrum)和扫描电镜(SEM)研究了退火温度和Al3+掺杂浓度对ZnO:Al薄膜结构和光学性能的影响。结果表明,随退火温度的升高或进行适当浓度的Al3+掺杂,可使(002)衍射峰的强度增强,晶粒尺寸增大,半高宽减小,薄膜的结晶质量明显改善,且可见光透过率高。更多还原

【Abstract】 ZnO:Al thin films were prepared on the glass substrates by the Sol-Gel method.The effects of different Al3+ dopant concentration and the annealing temperature on the structural and optical properties of ZnO:Al films were studied by using X-ray diffraction(XRD),UV-Vis transmittance spectrum and scanning electron microscope.The results indicated that the ZnO:Al thin films have a preferred c-axis(002) orientation perpendicular to the substrates.With increasing the annealing temperature or adding proper Al3+ dopant concentration,the intensities of the XRD diffraction peaks and the grain size increased,while the values of FWHM decreased.The thin films also have the high visible transmittance of >80%.It was demonstrated that the high quality ZnO:Al films can be prepared by properly controlling the annealing temperature and the Al3+ dopant concentration.更多还原