【摘要】 对高功率直流电弧等离子体喷射法制备的金刚石膜中的黑色层状缺陷进行了研究。沉积过程中通过改变沉积速率;适量加氧、加水、加氮;采用高纯气体;调整漏气率;多台设备并联运行;单台设备反复运行和交换零部件多种手段,均未找到其成因。中对用黑厚时位式新理念的研究作了报导。证实夹层成因和膜制备过程中的上述因素间无密切关系。更多还原

【Abstract】 The black lamellar defects are investigated,which was in diamond films and were prepared with DC Arc Plasma Jet CVD method.The cause of black lamellar defects were not found by various kinds of methods,such as changing deposition rate,adding proper amount of oxygen,water and nitrogen,adopting pure gases,adjusting gas leakage rate,parallel operation of multiple equipments,repeated operation of single equipment and exchanging parts.The black lamellar defects were found to be closely related with film formation process by using black thickness time sequence formulation.A new concept of black thickness time sequence formulation was reported in this paper.更多还原