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利用Kelvin探针力显微镜研究纳米尺度下n-AlGaN/GaN薄膜的表面电荷性质

Surface Charge Characteristics of n-AlGaN/GaN Heterostructures Films in Nano-scale by Kelvin Probe Force Microscopy in Vacuum

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【作者】 王凌凌杨文胜王德军谢腾峰

【Author】 WANG Ling-Ling,YANG Wen-Sheng,WANG De-Jun,XIE Teng-Feng(College of Chemistry,Jilin University,Changchun 130012,China)

【机构】 吉林大学化学学院

【摘要】 利用真空Kelvin探针力显微镜(KFM)研究了纳米尺度下n-AlGaN/GaN薄膜的表面电荷性质并进行了定量测量.结果表明,n-AlGaN/GaN薄膜的表面位错均为电活性的受主型表面态,所捕获电荷的区域远远大于表面位错的大小,其表面电势与GaN薄膜表面电势的最大差值达到590 mV.在光照下,n-AlGaN/GaN薄膜的表面电荷发生了明显的光生电荷重新分布现象.

【Abstract】 The surface charge characteristics of n-AlGaN/GaN heterostructures films in nano-scale were studied by means of Kelvin probe force microscopy(KFM) technique in vacuum.The results show that all the dislocations of n-AlGaN/GaN heterostructures films are negatively charged,and the maxinum contact potential difference between the dislocations and GaN is about 590 mV.Moreover the contact potential variations around the dislocations in n-AlGaN/GaN heterostructures films is much larger than that of dislocations in diameter.The photo-generated charges rediscontribution was observed under illumination.This result indicates that surface charges of semiconductor in nano-scale can be measured quantitatively by KFM in vacuum condition.

【基金】 国家重点基础研究发展计划项目(批准号:2007CB613303);国家自然科学基金(批准号:20703020,20873053)资助
  • 【文献出处】 高等学校化学学报 ,Chemical Journal of Chinese Universities , 编辑部邮箱 ,2011年01期
  • 【分类号】O649.2
  • 【被引频次】3
  • 【下载频次】304
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