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电感耦合等离子体质谱法测定高纯铼中26种痕量杂质元素
Determination of 26 trace-impurities in high purity rhenium by ICP-MS
【摘要】 以电感耦合等离子体质谱法(ICP-MS)测定了高纯铼中26种杂质元素含量。应用反应池技术消除了复合离子对K、Ca、Fe等元素的干扰,采用干扰方程校正技术消除了Re氧化物对Tl的质谱重叠干扰,未受干扰的其它杂质元素采用内标校正法直接测定。考察了溶液酸度、基体效应等条件对测定的影响,优化选择了测定同位素和内标元素。方法测定下限介于0.12~5.0μg/g,加标回收率在90%~110%之间,相对标准偏差小于10%。方法可以满足4N5高纯铼的测定。
【Abstract】 The 26 trace-impurities in high purity rhenium were determined by ICP-MS in this paper.The interferences for K,Ca,Fe and Tl produced by polyatomic ions were eliminated by reaction cell technology and the interference equation.Under the optimized conditions the acid and matrix effects were investigated.Determination limits obtained ranged between 0.12 and 5.0 μg/g for this 26 impurities.The accuracy of the method was evaluated by recovery measurements on spiked samples,and good recovery results(90%~110%) with precision of less than 10% were achieved.The method can be used for the analysis of 4N5 high purity rhenium products.
【Key words】 Inductively coupled plasma mass spectrometry(ICP-MS); Reaction cell technology; High purity rhenium; Trace impurities;
- 【文献出处】 分析试验室 ,Chinese Journal of Analysis Laboratory , 编辑部邮箱 ,2011年08期
- 【分类号】O657.63;TG115.33
- 【被引频次】17
- 【下载频次】173