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MPCVD单晶体金刚石的生长实验进展
Progress of Growth Experiment about MPCVD Single-Crystal Diamond
【摘要】 采用微波等离子体化学气相沉积(MPCVD)方法,在以往的实验条件上,改用CH4替代C2H5OH作为碳源,合成出单晶金刚石。使用宝石显微镜和环境扫描电子显微镜观察分析了MPCVD单晶金刚石膜的生长表面形貌。初步实验表明,在压力为12kPa,H2流量为300sccm,CH4流量为6sccm的生长环境中,可以合成出质量较好的MPCVD单晶金刚石。
【Abstract】 The Microwave plasma chemical vapor deposition(MPCVD) method is adopted,replaced the C2H5OH with CH4 as a carbon source and synthesized the single-crystal diamond on the basis of the past experience.The surface morphologies of MPCVD single-crystal diamond films are observed and analyzed by microscope and ESEM.The preliminary experiments show that the MPCVD single-crystal diamond with good quality can be synthesized at the growth conditions that the pressure was 12kPa,H2 flow rate is 300sccm,CH4 flow rate is 6sccm.
- 【文献出处】 材料导报 ,Materials Review , 编辑部邮箱 ,2011年S2期
- 【分类号】TQ164.8
- 【下载频次】240