【摘要】 在室温下,采用射频磁控溅射技术以较大的功率密度(7W/cm2)沉积了一系列掺铝氧化锌(AZO)透明导电薄膜,探索了溅射压强对沉积速率及薄膜性能的影响。结果表明,当工作压强为2.0Pa时,高速(67nm/min)沉积得到的薄膜的电阻率为2.63×10-3Ω.cm,可见光平均透过率为83%,并且在薄膜表面有一定的织构。更多还原

【Abstract】 A series of aluminium-doped zinc oxide(AZO) films were prepared by radio-frequency magnetron sputtering deposition system with high power density at room tempereature.Effects of pressure on the deposition rate and properties of the films were investigated.Low resitivity of 2.63×10-3Ω·cm and high average visible transmittance about 83% are obtained at the working pressure of 2.0Pa with a high depositon rate of 67nm/min,some surface textures are formed.更多还原