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Microstructure and strain analysis of GaN epitaxial films using in-plane grazing incidence x-ray diffraction

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【作者】 郭希王玉田赵德刚江德生朱建军刘宗顺王辉张书明邱永鑫徐科杨辉

【Author】 Guo Xi a),Wang Yu-Tian a),Zhao De-Gang a),Jiang De-Sheng a),Zhu Jian-Jun a),Liu Zong-Shun a),Wang Hui a),Zhang Shu-Ming a),Qiu Yong-Xin b),Xu Ke b),and Yang Hui a)b) a) State Key Laboratory on Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China b) Suzhou Institute of Nano-tech and Nano-bionics,Chinese Academy of Sciences,Suzhou 215125,China

【机构】 State Key Laboratory on Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of SciencesSuzhou Institute of Nano-tech and Nano-bionics,Chinese Academy of Sciences

【摘要】 This paper investigates the major structural parameters,such as crystal quality and strain state of (001)-oriented GaN thin films grown on sapphire substrates by metalorganic chemical vapour deposition,using an in-plane grazing incidence x-ray diffraction technique.The results are analysed and compared with a complementary out-of-plane xray diffraction technique.The twist of the GaN mosaic structure is determined through the direct grazing incidence measurement of (100) reflection which agrees well with the result obtained by extrapolation method.The method for directly determining the in-plane lattice parameters of the GaN layers is also presented.Combined with the biaxial strain model,it derives the lattice parameters corresponding to fully relaxed GaN films.The GaN epilayers show an increasing residual compressive stress with increasing layer thickness when the two dimensional growth stage is established,reaching to a maximum level of-0.89 GPa.

【Abstract】 This paper investigates the major structural parameters,such as crystal quality and strain state of (001)-oriented GaN thin films grown on sapphire substrates by metalorganic chemical vapour deposition,using an in-plane grazing incidence x-ray diffraction technique.The results are analysed and compared with a complementary out-of-plane xray diffraction technique.The twist of the GaN mosaic structure is determined through the direct grazing incidence measurement of (100) reflection which agrees well with the result obtained by extrapolation method.The method for directly determining the in-plane lattice parameters of the GaN layers is also presented.Combined with the biaxial strain model,it derives the lattice parameters corresponding to fully relaxed GaN films.The GaN epilayers show an increasing residual compressive stress with increasing layer thickness when the two dimensional growth stage is established,reaching to a maximum level of-0.89 GPa.

【基金】 supported by the National Natural Science Foundation of China (Grant Nos. 60506001,60776047,60976045 and 60836003);the National Basic Research Programme of China (Grant No. 2007CB936700);the National Science Foundation for Distinguished Young Scholars,China (Grant No. 60925017)
  • 【文献出处】 Chinese Physics B ,中国物理B , 编辑部邮箱 ,2010年07期
  • 【分类号】O484.5
  • 【被引频次】6
  • 【下载频次】51
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