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20keV钛离子注入植物种子深度浓度分布的模拟计算(英文)
Simulation of depth-concentration distribution for 20 keV titanium ions implanted into seed
【摘要】 通过创建植物种子靶材料模型和修正的LSS(纵向静态稳定性)理论,使用MonteCarlo方法,提出了一种离子注入植物种子近似计算方法,使用该方法计算了20 keV钛离子分别注入花生种子和彩棉种子的深度浓度分布.同时将本方法计算结果,TRIM程序计算结果,高斯拟合结果分别与实验测量结果进行了比较,本工作获得的计算结果更加接近实验值,并分析讨论了计算结果和实验结果差异的一些原因·
【Abstract】 A computational model for ions implanted into seed material was established according to the feature of seed using Monte Carlo method.Through revised LSS (longitudinal static stability) theory,a calculation method was proposed to simulate and calculate the depth-concentration distributions for 20keV titanium ions implanted into peanut seed and color cotton seed respectively.Compared with computational results of TRIM program and the results of Gaussian fitting,the results of this work were most matched with experiment results.Some reasons of the differences from the calculated results and experimental results were analyzed and discussed.
【Key words】 ion implantation; TRIM program; LSS theory; monte carlo method; depth-concentration distribution;
- 【文献出处】 原子与分子物理学报 ,Journal of Atomic and Molecular Physics , 编辑部邮箱 ,2010年05期
- 【分类号】TN305.3;Q947
- 【被引频次】1
- 【下载频次】26