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磁控溅射制备TiO2薄膜及其光学特性研究

The optical properties of titanium dioxide thin films deposited by dc reactive magnetron sputtering

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【作者】 周继承陈宇赵保星

【Author】 ZHOU Ji-cheng,CHEN Yu,ZHAO Bao-xing(School of Physics Science and Technology,Central South University,Changsha 410083,China)

【机构】 中南大学物理科学与技术学院

【摘要】 采用直流反应磁控溅射法在玻璃衬底上制备TiO2薄膜.用紫外-可见光分光光度计和AFM分别表征了薄膜的透射率和表面形貌,用包络线法详细研究了不同衬底温度下TiO2薄膜的光学特性.结果表明:薄膜在可见光波段有很高的透明度,且随着衬底温度的升高,薄膜的透射率略有增加,薄膜的折射率和吸收系数增大,薄膜的光学带隙减小;同时,薄膜表面粗糙度减小,薄膜变得平整.

【Abstract】 TiO2 thin films were prepared on glass by DC reactive magnetron sputtering.The surface morphology of the films was observed by AFM and the transmission spectra were measured by UV-VIS transmittance spectroscope.The optical properties of the films at different substrate temperature have been studied using the envelope method.The results show that the film has very high transparency in visible light wave band,besides,with the increase of substrate temperature,the transparency increases slightly,the refractive index and the absorption coefficient of TiO2 thin films increase,and the optical band gap decreases.Meanwhile,the surface roughness decreases and the film becomes even.

【基金】 湖南省科技计划重大专项基金资助项目(08FJ1002)
  • 【文献出处】 应用科技 ,Applied Science and Technology , 编辑部邮箱 ,2010年06期
  • 【分类号】O484.41
  • 【被引频次】7
  • 【下载频次】377
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