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氧化钇掺杂铁薄膜的制备及热稳定行为

The preparation and behavior in annealing of the yttria dispersed Ferrum films

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【作者】 李正操余晓毅苗伟马天张政军

【Author】 LI Zheng-cao,YU Xiao-yi,MIAO Wei,MA Tian,and ZHANG Zheng-jun State Key Laboratory of New Ceramic and Fine Processing Department of Material Science and Engineering Tsinghua University Beijing 10084P.R.China

【机构】 清华大学材料科学与工程系,新型陶瓷与精细工艺国家重点实验室

【摘要】 为研究氧化钇掺杂强化在薄膜中的应用,通过双靶磁控共溅射方法,制备了氧化钇弥散铁薄膜,利用X射线衍射仪、X射线荧光光谱仪、扫描电子显微镜和纳米压痕仪表征其结构、成分、形貌和纳米硬度.采用真空封管退火技术对薄膜进行热退火处理.实验结果表明,成功制备的铁基薄膜钇、氧元素弥散程度较好,在500℃真空退火处理后,铁薄膜的纳米硬度显著提高;随着氧化钇掺杂量的增多,纳米硬度增长率提高.该真空热处理方法为改善氧化物弥散强化合金的力学性能提供了借鉴.

【Abstract】 In order to investigate the yttria dispersed strength effect in thin films,double-target magnetron sputtering was carried out to prepare the yttria dispersed ferrum films.Crystal structure,composition,thickness and nano hardness were examined by X-ray diffraction,X-ray fluorescence,scanning electron microscope and nanoindenter.The films were annealed at enhancing temperature in a quartz tube after being vacuumed.Experimental results indicate that the nano hardness of ferrum films was enhanced significantly after 500 ℃ vacuum annealing,and the enhancing rate increased with the doping rate of yttria. This may provide reference for improving the mechanical property of ODS alloy.

【基金】 国家自然科学基金资助项目(50701026);国家重点基础研究发展计划资助项目(2010CB731600)~~
  • 【文献出处】 深圳大学学报(理工版) ,Journal of Shenzhen University Science and Engineering , 编辑部邮箱 ,2010年03期
  • 【分类号】TB383.2
  • 【被引频次】2
  • 【下载频次】190
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