【摘要】 以石英基片为衬底,分别在常压0.1 MPa和500 MPa高压条件下采用原位聚合法制备聚苯胺(PANI)薄膜.通过对PANI薄膜的厚度进行原子力显微镜的直接测量和光谱的间接表征,建立了薄膜厚度df(nm)与薄膜UV-Vis吸收光谱中400 nm处吸收强度A400间的关系:df=548A400(0.1 MPa)及df=341A400(500 MPa).根据这一关系进一步测量了薄膜的生长曲线,并通过扫描电镜(SEM)形貌观测和电导率测试,研究了原位聚合PANI薄膜在不同合成压力下的生长及导电特性.更多还原

【Abstract】 Polyaniline(PANI) films were in situ polymerized on the quartz substrates under the ambient pressures 0.1MPa and 500MPa.The thickness of the films was directly measured by AFM and indirectly characterized by the absorption at the wavelength 400 nm on UV-visible spectra.The relationship between df(nm) and the absorption A400 of PANI films was established,i.e.,df = 548A400 for the films prepared at 0.1 MPa,and df = 341A400 in the case of 500 MPa,respectively.Based on the relationship between df and A400,the growth curves for PANI films were obtained.By the observation of SEM and the conductivity measurement for the PANI films,the growth process and the electrical property of the films prepared under different pressures were investigated.更多还原