【摘要】 用XRD定量分析法研究了两种成分的高磷Ni-W-P镀层在不同热处理条件下的晶化组织、晶粒尺寸及微应变的演变规律。结果表明:在400℃晶化时,尽管P含量有所差异,但镀层的晶化程度趋于一致,且在400～500℃之间形成的Ni3P晶粒尺寸大于Ni;加热温度超过500℃,则Ni的尺寸大于Ni3P。温度达到700℃时,仍有残存的非晶相,其P含量越高,Ni3P转变的体积分数越大于Ni的分数。用XRD方法实测得到的残余应力温度范围在400～700℃之间,残余应力随温度升高而降低的变化规律与通过XRD计算的晶格应变的变化规律一致。镀态时镀层的晶格应变最大,非晶态程度越高,晶格应变越大。更多还原

【Abstract】 The evolution of amorphous electroless Ni-W-P coatings with different phosphorus content in the process of heat-treatment was investigated by means of SEM and a quantitative XRD method.The results show that when annealed at 400 ℃,the degree of crystallization for the coatings with 13.36% and 11.34% phosphorus tends to be the same,regardless of the phosphorus contents.Ni3 P phase and Ni phase are detected in the amorphous Ni-W-P coatings annealed at temperatures between 400 ℃ and 500 ℃,and the grain size of Ni3 P is larger than that of Ni phase.However,when the temperature exceeds 500 ℃,the grain size characteristics is reversed.When the temperature reaches 700 ℃,some amorphous phase still exists in the coatings,and higher phosphorus content results in higher amount of Ni3 P than Ni.Residual stress measured by XRD and lattice strain for the electroless deposited coatings treated within the temperature range of 400 ℃ to 700 ℃ exhibit similar trends with increasing temperature.The as-plated amorphous coatings present the maximum lattice strain and it decreases gradually with the crystallization of the coatings during annealing treatment.更多还原