【摘要】 介绍了一种适用于厚膜剥离的图形反转双层胶光刻技术,采用图形反转胶和正型光刻胶,选择合适的光刻工艺形成了光刻胶"倒梯形"的剖面结构,可以成功剥离与胶层厚度相同的膜层,厚度可达13μm。同时对一些技术机理和关键工艺条件进行了讨论。更多还原

【Abstract】 The paper introduced the image-reversal dual layer photolithography technology that is suitable for thick film lift-off.The reverse trapeziform shape of resist was made by coating a image-reversal resist layer on a thicker positive resist layer,this technology can achieve the 13 μm thick film lift-off without high edge.And some mechanism problems are discussed.更多还原