节点文献

光加热悬浮区熔法制备(Mo0.85Nb0.15)Si2单相单晶体

(Mo0.85Nb0.15)Si2 Single Phase Single Crystal Prepared by Photothermal Floating Zone Melting Method

  • 推荐 CAJ下载
  • PDF下载
  • 不支持迅雷等下载工具,请取消加速工具后下载。

【作者】 姜艳朱鸥张澜庭郁金星吴建生

【Author】 JIANG Yan,ZHU Ou,ZHANG Lan-ting,YU Jin-xing,WU Jian-sheng(School of Materials Science and Engineering,Shanghai Jiaotong University,Shanghai 200240,China)

【机构】 上海交通大学材料科学与工程学院

【摘要】 采用光加热悬浮区熔法制备了(Mo0.85Nb0.15)Si2单晶体,研究了化学成分和生长速度对获得C40结构单晶体的影响。结果表明:采用此法可制备出表面无裂纹的(Mo0.85Nb0.15)Si2单晶体,其尺寸可达8 mm×90 mm,晶体的生长面接近(0001)面,生长形态符合布拉维法则、周期键链(PBC)理论和小面生长理论。

【Abstract】 (Mo0.85Nb0.15)Si2 single crystals were prepared by using photothermal heating floating-zone melting method.The effects of chemical composition and growth speed on getting the C40 single crystal were studied.The results show that the crack-free(Mo0.85Nb0.15)Si2 single crystals with 8 mm in diameter and 90 mm in length were prepared using the method.The surface of crystal growth was close to the(0001) plane.The growth morphology accorded with Bravairs law,PBC theory and facet growth theory.

【基金】 国家自然科学基金资助项目(50571067);上海市浦江人才计划资助项目(05PJ14072)
  • 【文献出处】 机械工程材料 ,Materials for Mechanical Engineering , 编辑部邮箱 ,2010年01期
  • 【分类号】O614.612
  • 【被引频次】2
  • 【下载频次】136
节点文献中: 

本文链接的文献网络图示:

本文的引文网络