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孔径可调的介孔SiO2自支持薄膜的溶剂挥发诱导自组装合成与表征
Synthesis and Characteristic of Pore Size-tailored Self-supporting Mesoporous Film via Solvent Evaporation Induced Self-assembly
【摘要】 以十六烷基三甲基溴化铵(CTAB)为模板剂,正硅酸乙酯为硅源,在弱酸性条件下利用溶剂挥发诱导自组装(EISA)合成出具有介孔结构的二氧化硅薄膜.通过控制EISA过程中溶剂挥发的环境,可在1.4~3.1nm的范围内调节介孔结构的孔径.实验表明,较快的溶剂挥发速率有助于较大孔径的介孔结构生成.用该方法合成的介孔薄膜具有蠕虫状孔道结构和良好的孔径均一性.在外观上,该薄膜具有均匀、透明和无缺陷等特点,可以自支撑,并且具有一定的韧性.
【Abstract】 Mesoporous silica films with pore diameters of 1.7—3.1 nm were synthesized through evaporation induced self-assembly using CTAB as surfactant and TEOS as Si source in weak acid media.The films were flexible,self-supporting and centimeter-sized with wormhole-like channel systems.By controlling the solvent remove process,the pore size of films could be tailored without negative influence on the pore size uniformity.A fast volatilization speed would lead to a large pore size,while a slow volatilization speed would result in a small pore size.
【Key words】 Mesoporous film; Solvent evaporation induced self-assembly; Pore size tailoring;
- 【文献出处】 高等学校化学学报 ,Chemical Journal of Chinese Universities , 编辑部邮箱 ,2010年11期
- 【分类号】O613.72
- 【被引频次】5
- 【下载频次】562