节点文献

Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering

  • 推荐 CAJ下载
  • PDF下载
  • 不支持迅雷等下载工具,请取消加速工具后下载。

【作者】 牟宗信王春牟晓东贾莉刘升光董闯

【Author】 MU Zongxin,WANG Chun,MU Xiaodong JIA Li LIU Shengguang,DONG Chuang Key Laboratory of Materials Modification by Laser,Ion and Electron Beams,Ministry of Education, School of Physics and Optoelectronic technology,Dalian University of Technology, Dalian 116024,China

【机构】 Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education, School of Physics and Optoelectronic technology, Dalian University of Technology

【摘要】 <正> An experimental study of the effect of applied magnetic field on the properties of theplasma and electrostatic oscillations in an unbalanced magnetron sputtering discharge was carriedout. The apparatus consists of a magnetron sputtering target, using the conventional magneticfield configuration, and a coaxial coil around the target for an applied axial magnetic field, Thedependencies of plasma parameters on the coil current were studied by two Langmuir probes.The resonance properties of electrostatic oscillations were observed. The results indicate that theapplied magnetic field affects the plasma properties for the coil current in a range of 0 A to 8 A.The frequency bandwidth of the electrostatic oscillations in the unbalanced magnetron sputteringplasma is in a range of 0 kHz to 300 kHz. From the spectrum analysis, the eigenfrequency nearthe target is in a range of 20 kHz to 50 kHz under typical experimental conditions where all themagnetic field, pressure, and power etc are able to have full impact on the spectrum characteristics.The calculated value of the electron temperature as per an ion acoustic standing wave patterninside the magnetic trap is in good agreement with the experimental result.

【Abstract】 An experimental study of the effect of applied magnetic field on the properties of the plasma and electrostatic oscillations in an unbalanced magnetron sputtering discharge was carried out. The apparatus consists of a magnetron sputtering target, using the conventional magnetic field configuration, and a coaxial coil around the target for an applied axial magnetic field, The dependencies of plasma parameters on the coil current were studied by two Langmuir probes. The resonance properties of electrostatic oscillations were observed. The results indicate that the applied magnetic field affects the plasma properties for the coil current in a range of 0 A to 8 A. The frequency bandwidth of the electrostatic oscillations in the unbalanced magnetron sputtering plasma is in a range of 0 kHz to 300 kHz. From the spectrum analysis, the eigenfrequency near the target is in a range of 20 kHz to 50 kHz under typical experimental conditions where all the magnetic field, pressure, and power etc are able to have full impact on the spectrum characteristics. The calculated value of the electron temperature as per an ion acoustic standing wave pattern inside the magnetic trap is in good agreement with the experimental result.

【关键词】 plasmamagnetron sputteringoscillationresonance
【Key words】 plasmamagnetron sputteringoscillationresonance
【基金】 supported by National Natural Science Foundation of China (No.50407015)
  • 【文献出处】 Plasma Science and Technology ,等离子体科学和技术(英文版) , 编辑部邮箱 ,2010年05期
  • 【分类号】O53
节点文献中: 

本文链接的文献网络图示:

本文的引文网络