节点文献
Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering
【摘要】 <正> An experimental study of the effect of applied magnetic field on the properties of theplasma and electrostatic oscillations in an unbalanced magnetron sputtering discharge was carriedout. The apparatus consists of a magnetron sputtering target, using the conventional magneticfield configuration, and a coaxial coil around the target for an applied axial magnetic field, Thedependencies of plasma parameters on the coil current were studied by two Langmuir probes.The resonance properties of electrostatic oscillations were observed. The results indicate that theapplied magnetic field affects the plasma properties for the coil current in a range of 0 A to 8 A.The frequency bandwidth of the electrostatic oscillations in the unbalanced magnetron sputteringplasma is in a range of 0 kHz to 300 kHz. From the spectrum analysis, the eigenfrequency nearthe target is in a range of 20 kHz to 50 kHz under typical experimental conditions where all themagnetic field, pressure, and power etc are able to have full impact on the spectrum characteristics.The calculated value of the electron temperature as per an ion acoustic standing wave patterninside the magnetic trap is in good agreement with the experimental result.
【Abstract】 An experimental study of the effect of applied magnetic field on the properties of the plasma and electrostatic oscillations in an unbalanced magnetron sputtering discharge was carried out. The apparatus consists of a magnetron sputtering target, using the conventional magnetic field configuration, and a coaxial coil around the target for an applied axial magnetic field, The dependencies of plasma parameters on the coil current were studied by two Langmuir probes. The resonance properties of electrostatic oscillations were observed. The results indicate that the applied magnetic field affects the plasma properties for the coil current in a range of 0 A to 8 A. The frequency bandwidth of the electrostatic oscillations in the unbalanced magnetron sputtering plasma is in a range of 0 kHz to 300 kHz. From the spectrum analysis, the eigenfrequency near the target is in a range of 20 kHz to 50 kHz under typical experimental conditions where all the magnetic field, pressure, and power etc are able to have full impact on the spectrum characteristics. The calculated value of the electron temperature as per an ion acoustic standing wave pattern inside the magnetic trap is in good agreement with the experimental result.
【Key words】 plasma; magnetron sputtering; oscillation; resonance;
- 【文献出处】 Plasma Science and Technology ,等离子体科学和技术(英文版) , 编辑部邮箱 ,2010年05期
- 【分类号】O53