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Measurement of OH Radicals in Dielectric Barrier Discharge Plasmas by Cavity Ring-Down Spectroscopy

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【作者】 赵国利朱爱民吴家婷刘忠伟徐勇

【Author】 ZHAO Guoli~1,ZHU Aimin~(1,2), WU Jiating~1, LIU Zhongwei~1, XU Yong~(1,2) 1 Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, China 2 Laboratory of Materials Modification by Beams, Dalian University of Technology, Dalian 116024, China

【机构】 Laboratory of Plasma Physical Chemistry, Dalian University of TechnologyLaboratory of Materials Modification by Beams, Dalian University of Technology

【摘要】 <正> Near-infrared continuous wave cavity ring-down spectroscopy was applied to measurethe OH radicals in dielectric barrier discharge plasmas, which play an important role incombustion systems, atmospheric chemistry and the removal of air pollutants by non-thermalplasmas. The P-branches of OH X~∏_i (ν′=2←ν″=0) bands were used for number densitymeasurements. The OH number density and plasma temperature were determined for differentapplied voltages, gas pressures and concentrations of both oxygen and water. The temporal evolutionof the OH number density was obtained by using the "time window" method, which was usedto extract individual ring-down times at different times in a half period of the sine wave appliedvoltage in dielectric barrier discharge plasmas.

【Abstract】 Near-infrared continuous wave cavity ring-down spectroscopy was applied to measure the OH radicals in dielectric barrier discharge plasmas, which play an important role in combustion systems, atmospheric chemistry and the removal of air pollutants by non-thermal plasmas. The P-branches of OH X~∏_i (ν′=2←ν″=0) bands were used for number density measurements. The OH number density and plasma temperature were determined for different applied voltages, gas pressures and concentrations of both oxygen and water. The temporal evolution of the OH number density was obtained by using the "time window" method, which was used to extract individual ring-down times at different times in a half period of the sine wave applied voltage in dielectric barrier discharge plasmas.

【基金】 supported by National Natural Science Foundation of China (Nos.10475015, 10975029)
  • 【文献出处】 Plasma Science and Technology ,等离子体科学和技术(英文版) , 编辑部邮箱 ,2010年02期
  • 【分类号】O461
  • 【被引频次】3
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