Effect of Krypton Addition on Electron Cyclotron Resonance-Radio Frequency Hybrid Oxygen Plasma for Patterning Diamond Surfaces

【摘要】 <正> Electron cyclotron resonance radio frequency （ECR-rf） hybrid krypton-diluted oxygenplasmas were used to pattern the surfaces of diamond films with the assistance of a physicalmask, while optical emission spectroscopy was employed to characterize the plasma. It was foundthat with krypton dilution the etching rate decreased, and also the aspect ratios of nanotips formedin micro-holes were significantly modified. The oxygen atomic densities were estimated by oxygenatom optical emission and argon actinometry. Under a microwave power of 300 W and rf biasof-300 V, the absolute density of ground-state oxygen atoms decreased from 1.3×10¹² cm^-3 to1.4×10¹¹ cm^-3 as the krypton dilution ratio increased to 80%, accompanied by the decrease inthe plasma excitation temperature. It is concluded that oxygen atoms play a dominant role indiamond etching. The relative variations in the horizontal and vertical etching rates induced bythe addition of krypton are attributed to the observations of thicker nanotips at a high kryptondilution ratio.更多还原

【Abstract】 Electron cyclotron resonance radio frequency （ECR-rf） hybrid krypton-diluted oxygen plasmas were used to pattern the surfaces of diamond films with the assistance of a physical mask, while optical emission spectroscopy was employed to characterize the plasma. It was found that with krypton dilution the etching rate decreased, and also the aspect ratios of nanotips formed in micro-holes were significantly modified. The oxygen atomic densities were estimated by oxygen atom optical emission and argon actinometry. Under a microwave power of 300 W and rf bias of-300 V, the absolute density of ground-state oxygen atoms decreased from 1.3×10¹² cm^-3 to 1.4×10¹¹ cm^-3 as the krypton dilution ratio increased to 80%, accompanied by the decrease in the plasma excitation temperature. It is concluded that oxygen atoms play a dominant role in diamond etching. The relative variations in the horizontal and vertical etching rates induced by the addition of krypton are attributed to the observations of thicker nanotips at a high krypton dilution ratio.更多还原