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三价铬电镀的研究现状及发展
Current Status of Research and Development of Trivalent Chromium Plating
【摘要】 着重阐述了三价铬的发展历史、电镀工艺、阴极反应机理及电镀中存在的问题。对于当前镀铬中存在的问题,从电镀体系的选择、配位剂的选择、阳极及电镀电源的选择、pH值的影响等方面进行了分析与总结。最后对三价铬电镀的发展作了展望。
【Abstract】 A review was provided of the histo-ry,electroplating technology,cathodic reaction mechanism and existing problems in trivalent chromium electroplating. The exist-ing problems were analyzed and discussed in the light of selection of electroplating system,complexing agent,anode and power source as well as the influence of pH value. Finally,the develop-ment of trivalent chromium electroplating was prospected.
【关键词】 三价铬电镀;
反应机理;
发展状况;
【Key words】 trivalent chromium electroplating; reaction mecha-nism; current status of research;
【Key words】 trivalent chromium electroplating; reaction mecha-nism; current status of research;
- 【文献出处】 材料保护 ,Materials Protection , 编辑部邮箱 ,2010年04期
- 【分类号】TQ153
- 【被引频次】13
- 【下载频次】623