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Effect of trapped charge accumulation on the retention of charge trapping memory

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【作者】 金锐刘晓彦杜刚康晋锋韩汝琦

【Author】 Jin Rui Liu Xiaoyan Du Gang Kang Jinfeng and Han Ruqi (Institute of Microelectronics,Peking University,Beijing,100871,China)

【机构】 Institute of Microelectronics,Peking University

【摘要】 <正>The accumulation process of trapped charges in a TANOS cell during P/E cycling is investigated via numerical simulation. The recombination process between trapped charges is an important issue on the retention of charge trapping memory. Our results show that accumulated trapped holes during P/E cycling can have an influence on retention,and the recombination mechanism between trapped charges should be taken into account when evaluating the retention capability of TANOS.

【Abstract】 The accumulation process of trapped charges in a TANOS cell during P/E cycling is investigated via numerical simulation. The recombination process between trapped charges is an important issue on the retention of charge trapping memory. Our results show that accumulated trapped holes during P/E cycling can have an influence on retention,and the recombination mechanism between trapped charges should be taken into account when evaluating the retention capability of TANOS.

【基金】 Project supported by Samsung Electronics Co.Ltd.(Nos.20060001050,2006CB302705)
  • 【文献出处】 半导体学报 ,Journal of Semiconductors , 编辑部邮箱 ,2010年12期
  • 【分类号】O472.4
  • 【被引频次】2
  • 【下载频次】63
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