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Ultra high-speed InP/InGaAs SHBTs with ft and fmax of 185 GHz

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【作者】 周磊金智苏永波王显泰常虎东徐安怀齐鸣

【Author】 Zhou Lei Jin Zhi Su Yongbo Wang Xiantai Chang Hudong Xu Anhuai and Qi Ming (1 Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029,China) (2 Key Laboratory of Microelectronics Devices & Integrated Technology,Institute of Microelectronics, Chinese Academy of Sciences,Beijing 100029,China) (3 Shanghai Institute of Microsystem and Information Technology,Chinese Academy of Sciences,Shanghai 200050,China)

【机构】 Institute of Microelectronics,Chinese Academy of SciencesKey Laboratory of Microelectronics Devices & Integrated Technology,Institute of Microelectronics,Chinese Academy of SciencesShanghai Institute of Microsystem and Information Technology,Chinese Academy of Sciences

【摘要】 <正>An InP/InGaAs single heterojunction bipolar transistor(SHBT) with high maximum oscillation frequency (fmax) and high cutoff frequency(ft) is reported.Efforts have been made to maximize fmax and ft simultaneously including optimizing the epitaxial structure,base-collector mesa over-etching and base surface preparation.The measured ft and fmax both reached 185 GHz with an emitter size of 1×20μm2,which is the highest fmax for SHBTs in China’s mainland.The device is suitable for ultra-high speed digital circuits and low power analog applications.

【Abstract】 An InP/InGaAs single heterojunction bipolar transistor(SHBT) with high maximum oscillation frequency (fmax) and high cutoff frequency(ft) is reported.Efforts have been made to maximize fmax and ft simultaneously including optimizing the epitaxial structure,base-collector mesa over-etching and base surface preparation.The measured ft and fmax both reached 185 GHz with an emitter size of 1×20μm2,which is the highest fmax for SHBTs in China’s mainland.The device is suitable for ultra-high speed digital circuits and low power analog applications.

【基金】 supported by the State Key Development Program for Basic Research of China(No.2010CB327502);the National Natural Science Foundation of China(No.60976064)
  • 【文献出处】 半导体学报 ,Journal of Semiconductors , 编辑部邮箱 ,2010年09期
  • 【分类号】TN322.8
  • 【被引频次】2
  • 【下载频次】42
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