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磁控溅射WO3薄膜的电致变色机理研究
Electrochromic Performance of Magnetron Sputtering WO3 Thin Film
【摘要】 在不同氧分压条件下对WO3粉末靶进行磁控溅射,在ITO导电玻璃基底上沉积得到WO3薄膜。分析发现,当氧分压O2∶Ar为1∶10的时,WO3薄膜的显微组织均匀细密,薄膜原态的透光率可达88%。将WO3薄膜作为不同电极在LiClO4溶液中进行电色反应,发现着色态透光率在紫光区可达41%,在整个红外区透光率最高不过25%;而漂白态在紫光区可达85%,在整个红外区透光率在82%左右。采用XPS光电子能谱研究了WO3薄膜的电致变色机理,发现遵循典型的双离子注入模型。
【Abstract】 A series of WO3 films are prepared on ITO conductive thin film by magnetron sputtering under different partial pressures of oxygen.It is found that the films with oxygen partial pressure ratio 1:10 present fine uniform microstructure.The transmittance of original-state film is up to 88%.WO3 thin film react in LiClO4 solution.The transmittance of color-state is up to 41% in ultraviolet region,the highest transmittance in the infrared region is no more than 25%.At the same time,the transmittance of bleached-state is up to 85% in ultraviolet region,the transmittance in the infrared region is about 82%.Electrochromic mechanism of WO3 thin film is studied using photoelectron spectroscopy XPS.It follows the law of typical dual ion implantation model.
【Key words】 Magnetron sputtering; WO3 thin film; Electrochromic; Transmittance; XPS spectrum;
- 【文献出处】 铸造技术 ,Foundry Technology , 编辑部邮箱 ,2009年09期
- 【分类号】TB383.2
- 【被引频次】5
- 【下载频次】183