【摘要】 采用分子自组装技术,在铜电极表面形成一层1,3-二巯基硫醇(BDT)单分子自组装膜。通过交流阻抗、极化曲线和循环伏安等电化学方法探讨该自组装膜在3%NaCl溶液中对铜电极的缓蚀作用。实验表明:BDT能够有效地组装到铜的表面形成单分子自组装膜,BDT自组装膜能有效地抑制铜基底在3%NaCl腐蚀介质以及酸性NaCl溶液中的腐蚀行为;缓蚀效率随组装时间的延长逐渐升高并趋于稳定,在pH值较低的溶液中仍具有较好的缓蚀效果;当BDT浓度为1.0×10-2mol/L、组装时间为40h时,铜电极的腐蚀电流最小,缓蚀效率最好。更多还原

【Abstract】 Adopting molecular self-assembly technique, a self-assembled membrane of 1, 3-benzenedithiol(BDT) was formed on the surface of the copper electrode.The effect of this membrane on the corrosion inhibition of copper electrode in 3% NaCl solution was investigated by using electrochemical impedance spectroscopy(EIS), polarization curve and cyclic voltammetry(CV).The results show that BDT can be assembled on the surface of copper electrode to form monomolecular self-assembled membrane,and the membrane can efficiently inhibit the copper base corrosion in the 3% NaCl corrosion medium and acidic solution.The inhibition efficiency increases with increasing assembling time and obtains steady state gradually.In the solution with lower pH value, BDT can also keep good inhibitor.When the copper electrode is modified with 1.0×10-2 mol/L BDT for 40 h, the corrosion current is the smallest, the inhibition efficiency is the highest.更多还原