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紫外级氧化铪的生产工艺研究

Preparation of the UV Grade HfO2

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【作者】 张少辉张碧田何芬

【Author】 Zhang Shaohui,Zhang Bitian,He Fen(Institute of Advanced Mineral Processing and Metallurgy,General Research Institute for Non-Ferrous Metals,Beijing 100088,China)

【机构】 北京有色金属研究总院矿物资源与冶金材料研究所

【摘要】 紫外级氧化铪具有优异的光学性能和抗激光损伤性能,是制备高功率激光薄膜、高折射率紫外薄膜以及其他光学薄膜的重要材料。锆铪分离是制备紫外级氧化铪的关键。本实验研究了N235-H2SO4萃取分离锆铪体系的影响因素,并得到用N235-H2SO4萃取分离体系制备低锆氧化铪的最佳工艺。经过4级萃取,制备出含锆量低于0.1%的紫外级氧化铪。

【Abstract】 Owing to the excellent optical properties and laser damage resistance,the UV grade HfO2 became one of the most commonly used optical coating materials for optical components,laser-damage-resistant applications and high index UV coatings.The separation technique between Zr and Hf was the key of the UV grade HfO2 production.It was investigated that some factors about the N235-H2SO4 extraction system for separation hafnium and zirconium and established the best process used in the N235-H2SO4 extraction separation system to prepare HfO2 with trace ZrO2.After four stages extraction,HfO2 with lower than 0.1% ZrO2 was prepared.

【关键词】 锆铪分离N235萃取工艺氧化铪
【Key words】 separation between Zr and HfN235extractionHfO2
  • 【文献出处】 稀有金属 ,Chinese Journal of Rare Metals , 编辑部邮箱 ,2009年03期
  • 【分类号】TF841.4
  • 【被引频次】1
  • 【下载频次】185
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