【摘要】 采用磁控溅射离子镀技术在贫铀表面以不同基片偏压与不同氩分压制备铝镀层,利用扫描电镜分析了镀层的表面和界面形貌,利用俄歇电子能谱仪分析了界面元素分布,利用透射电镜分析了镀层的微观结构。结果表明:铀表面脉冲偏压所得铝镀层较直流偏压所得镀层致密,脉冲偏压在-500～-1000V范围内镀层的致密性较好。铀表面脉冲偏压铝镀层与铀基体之间界面结合紧密,且存在"伪扩散层";随着脉冲偏压的提高,"伪扩散层"增宽。铝镀层为柱状结构,降低工作氩分压,可以细化铝镀层的晶粒,提高镀层的致密性。更多还原

【Abstract】 Aluminum was coated by ion magnetron sputtering process on depleted uranium surface under different substrate bias and argon partial pressures. Surface and interfacial morphologies of aluminum coating were observed with SEM, and the elemental profile of interface between coating and substrate was analyzed with Auger electron spectrometer with the microstructure of coating analyzed by TEM. The results indicated that the aluminum coating at pulsed bias is more compact than at DC bias, and the compactness of coating is better if the pulsed bias is in the range from -500V to -1000V. It was found that the coating adheres to substrate tightly with "pseudo -diffusion layer"existing in interfacial zone between coating and substrate. With increasing pulsed bias, the "pseudo-diffusion layer"broadens. The coating is of columnar structure and, with decreasing argon partial pressure, grain refining in the coating is available so as to improve its compactness.更多还原