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MgO二次电子发射功能薄膜的制备方法
PREPARATION METHODS OF MgO THIN FILMS WITH SECONDARY ELECTRON EMISSION
【摘要】 综述了具有二次电子发射功能的MgO薄膜的主要制备方法,包括电子束蒸发、磁控溅射、溶胶-凝胶、分子束外延和脉冲激光沉积法。阐述了各种方法在制备MgO薄膜方面的优点和不足,讨论了不同的制备方法对MgO薄膜结晶取向、表面形貌等性质的影响。分析表明,利用磁控溅射法制备MgO薄膜可获得较高的二次电子发射率。
【Abstract】 The main methods of preparing MgO thin films,including Electron-beam evaporation,Magnetron sputtering, Sol-gel,MBE and PLD were reviewed.The advantages and shortcomings of these methods in MgO film preparation are represented.The effects of different growth conditions on crystalline orientations and surface morphology of MgO thin film arc discussed.The results show that a higher rate of secondary electron emission has been gained by magnetron sputtering preparing MgO films.
【关键词】 MgO薄膜;
二次电子;
磁控溅射;
结晶取向;
【Key words】 MgO thin film; secondary electron; magnetron sputtering; crystalline orientation;
【Key words】 MgO thin film; secondary electron; magnetron sputtering; crystalline orientation;
- 【文献出处】 真空与低温 ,Vacuum and Cryogenics , 编辑部邮箱 ,2009年04期
- 【分类号】O484.1
- 【被引频次】17
- 【下载频次】334