【摘要】 用电子束蒸发方法制造了Al2O3、LaF3单层膜,对比研究了沉积速率和基板温度对薄膜紫外(193 nm)光学特性、微结构的影响.实验结果表明,LaF3在紫外波段的光学损耗明显小于Al2O3.AFM测试发现,在相同的工艺条件下,Al2O3表面粗糙度大于LaF3,且LaF3薄膜表面粗糙度随基板温度增加而增加.Al2O3薄膜在紫外波段的光学特性严重依赖于沉积速率等制备条件,而沉积速率对LaF3薄膜特性的影响不明显,即使是在5 nm/s的速率条件下,LaF3仍具有良好的光学特性.X射线衍射(XRD)测试发现,电子束蒸发制备的Al2O3薄膜为非晶态,LaF3薄膜有结晶现象.更多还原

【Abstract】 Single layers of Al2O3 and LaF3 were obtained by E-beam evaporation.The effect of the deposition rate and substrate temperature on the optical properties and microstructure was discussed.Optical loss of LaF3 was less than that of Al2O3 in the UV-band.With the same preparation conditions,the surface roughness of Al2O3 was higher than that of LaF3.Optical properties of the Al2O3 film depended heavily on preparation conditions.The deposition rate had little effect on the LaF3 film.The properties of LaF3 were perfect when the deposition rate was 5 nm/s.Al2O3 films prepared by electron beam evaporation was amorphous,and the LaF3 film was crystalloid.The surface roughness of the LaF3 film increased with the raise of the substrate temperature.更多还原