【摘要】 采用脉冲电解沉积工艺制备厚度约60μm的金属镍薄膜。当脉冲电流密度为7.5×10-2A/m2,通断时间比为1/25,pH=4.5,T=50℃时,所制备镍薄膜的平均晶粒尺寸约20nm,硬度为637HV。在电流密度一定时,晶粒尺寸随脉冲通断时间比减小而变小,硬度增大。与常规粗晶镍材料相比,纳米晶体结构镍薄膜的耐摩擦性能得到显著改善,在恒定压力下滑擦5次,纳米晶体结构镍薄膜的磨损深度从25nm增加到30nm,摩擦系数在0.13~0.20之间,而粗晶镍薄膜的磨损深度从35nm增加到46nm,摩擦系数在0.19~0.31之间。更多还原

【Abstract】 The nanocrystalline(nc) nickel coatings with a thickness of about 60μm are prepared by pulse-electrodeposition process.The average grain size of deposited coating with the electrolysis parameters of pulsed current density 6×10-2 A/m2,pH=4.5,T=50℃,on-time(ton) of 1ms and off-time(toff) of 25ms,is about 20nm and the micro-hardness value can be as high as 6.37GPa.The grain size of the deposited coating is decreased with the decrease of ton/toff with the constant current density,but the hardness value is reversed.The wear resistance of the prepared nanocrystalline film is significantly improved compared to the normal nickel material.Under a constant normal load with 5 times sliding scan,the penetration depth of indenter is slightly increased from 25nm to 30nm and the coefficient of friction is varied between 0.12 to 0.20,while those of CG Ni is increased from 35nm to 46nm,and varied between 0.19 to 0.31,respectively.更多还原