【摘要】 原料采用在Fe(0.03%,质量分数)∶LN中掺进摩尔分数为(1%、2%、4%、5%)的HfO2,再次采用提拉法生长Hf∶Fe∶LN晶体。抗光损伤阈值测试表明,Hf(5%,摩尔分数)∶Fe∶LN晶体抗光损伤能力比Hf(1%,摩尔分数)∶Fe∶LN晶体提高2个数量级以上。以二波耦合光路测试晶体的衍射效率,写入时间和擦除时间,并计算出光折变灵敏度和动态范围。结果表明,Hf∶Fe∶LN晶体全息存储性能优于Fe∶LN晶体。更多还原

【Abstract】 Doping with(1%,2%,4%,5%)(in mole) HfO2 in Fe(0.03%)∶LN,Hf∶Fe∶LN crystals have been grown by Czochralski method.The optical damage resistance of Hf(5%)∶Fe∶LN crystals is about two orders of magnitude higher than that of Hf(1%)∶Fe∶LN.The diffraction efficiency,writing time and erasure time of crystals were measured by two wave coupling photo-path and the photorefractive sensitivity and dynamic range were calculated.The results show that the holographic storage properties of Hf∶Fe∶LN crystals are superior to Fe∶LN crystals.更多还原