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TFT-LCD成盒工程中配向不良的改善

The Improvement of Disclination Defect in TFT-LCD Cell Process

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【作者】 王银春李卓李荣玉

【Author】 WANG Yin-chun1,2,LI Zhuo2,LI Rong-yu1(1.Department of Electronic Engineering,Shanghai 200030,China;2.Shanghai SVA NEC Liquid Crystal Display Co.,LTD,Shanghai 201108,China)

【机构】 上海交通大学电子信息与电气工程学院上海广电NEC液晶显示器有限公司

【摘要】 从生产角度研究了TFT-LCD成盒工程中配向不良发生的原因,通过对TFT基板、PI液的调查,通过对彩膜基板色层断差、角断差等的量测明确了角断差对此不良的影响,分别在摩擦工程、本硬化工程对这项不良进行改善,结果表明本硬化工程工艺条件的改进对改善该不良有明显效果,并通过一组实验得到最优化本硬化条件,最终改善了该不良。

【Abstract】 According to mass production,the cause of the disclination in TFT-LCD Cell process has been studied.Through analysing TFT substrate,PI,thickness and "Tuno Dansa" of Color layers,the last factor "Tuno Dansa" was proved as the root cause of disclination.It has been sought to improve this defect from TFT-LCD Cell process,such as rubbing and anneal,then found that adjusting anneal process was quite effective.Meanwhile,the best anneal process condition was acquired by a set of test.

【关键词】 薄膜晶体管液晶显示角断差配向
【Key words】 TFT-LCDTuno Dansadisclination
  • 【分类号】TN873
  • 【被引频次】6
  • 【下载频次】347
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