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Interfacial Microstructure and Properties of Ti(C, N)/Ni Bonded by Transient Liquid-phase Diffusion

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【作者】 周世权熊惟皓

【Author】 ZHOU Shiquan1, 3, LI Xiaogang3, XIONG Weihao2*, ZHOU Yunhong3 (1. School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China; 2. School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China; 3. Department of Mechanical Engineering, University of Waterloo, Waterloo, ON, Canada N2L 3G1)

【机构】 School of Mechanical Science and Engineering, Huazhong University of Science and TechnologyDepartment of Mechanical Engineering, University of WaterlooSchool of Materials Science and Engineering, Huazhong University of Science and Technology

【摘要】 Effects of the main process parameters(temperature and time) on microstructure and properties of Ti(C, N)/Ni interface bonded by (Cu+Nb) interlayer in a vacuum diffusion bonding device were investigated. The interfacial microstructures consisted initially of Ni3Nb metallic compound and eutectic of Ni3Nb+CuNiSS, and finally transformed to (Ti, Nb) (C, N)+Ni3Nb near Ti (C, N) and NiCuSS+Ni3Nb near Ni when diffusion bonding temperature was 1 523-1 573 K. It was clear that Cu was a constituent in the transient liquid phase (TLP) into which Ni was dissolved by forming Cu-Ni transition liquid. Nb was dissolved in Cu-Ni transition liquid rapidly. Ti (C, N) conld be wetted by resultant Ni-Nb-Cu transient liquid phase which was followed by a little (Ti, Nb) (C, N) solid solution formed at interface. This increased the interface combining capability. Ultimately the interface shear strength was able to reach 140 MPa. The theoretle analysis and experimental results show that the growth of interfacial reaction layer Ni3Nb accords with parabola law, and the activation energy of diffusion reaction is 115.0±0.5 kJ/mol, while the diffusion reaction speed constant is 12.53 mm/s1/2.

【Abstract】 Effects of the main process parameters(temperature and time) on microstructure and properties of Ti(C, N)/Ni interface bonded by (Cu+Nb) interlayer in a vacuum diffusion bonding device were investigated. The interfacial microstructures consisted initially of Ni3Nb metallic compound and eutectic of Ni3Nb+CuNiSS, and finally transformed to (Ti, Nb) (C, N)+Ni3Nb near Ti (C, N) and NiCuSS+Ni3Nb near Ni when diffusion bonding temperature was 1 523-1 573 K. It was clear that Cu was a constituent in the transient liquid phase (TLP) into which Ni was dissolved by forming Cu-Ni transition liquid. Nb was dissolved in Cu-Ni transition liquid rapidly. Ti (C, N) conld be wetted by resultant Ni-Nb-Cu transient liquid phase which was followed by a little (Ti, Nb) (C, N) solid solution formed at interface. This increased the interface combining capability. Ultimately the interface shear strength was able to reach 140 MPa. The theoretle analysis and experimental results show that the growth of interfacial reaction layer Ni3Nb accords with parabola law, and the activation energy of diffusion reaction is 115.0±0.5 kJ/mol, while the diffusion reaction speed constant is 12.53 mm/s1/2.

【基金】 Funded by the National Natural Science Foundation of China (No.50074017/E0408)
  • 【文献出处】 Journal of Wuhan University of Technology(Materials Science Edition) ,武汉理工大学学报(材料科学版)(英文版) , 编辑部邮箱 ,2009年03期
  • 【分类号】O611.3
  • 【被引频次】3
  • 【下载频次】101
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