【摘要】 为了改善RBSiC陶瓷反射率较低的情况,利用RF磁控溅射法在RBSiC基底表面涂覆一层结构致密的PVDSiC涂层。采用XRD表征了PVDSiC涂层的晶化程度。利用AFM和表面轮廓仪观察了RBSiC基底和PVDSiC涂层抛光后的表面形貌和表面粗糙度,并在可见光和红外波段测量了反射率。结果表明,当采用PVDSiC涂层对RBSiC基底表面改性后,抛光后其表面缺陷明显减少,表面粗糙度Ra为0.809nm,反射率提高约为2%,最高可达99.2%,改性效果明显。PVDSiC涂层有望在可见光和红外波段获得实际应用。更多还原

【Abstract】 In order to improve the low reflectance of polished RB SiC, the dense structure PVD SiC coating was coated on the surface of RB SiC substrate by RF magnetron sputtering. The crystal phase of PVD SiC coating was characterized by XRD. The surface morphology and the surface roughness of RB SiC substrate and PVD SiC coating were measured by AFM and surface profilometer. The reflectance was determined in the visible and IR range. The results show that: when the surface of RB SiC substrate is coated with PVD SiC coating, the surface defects decrease obviously after polished. The surface roughness yields to 0.809nm. The reflectance increases about 2%. The highest reaches 99.2%. The effect of improvement upgrades significantly. It demonstrates that PVD SiC coating is hoped to be used in visible and IR region.更多还原