【摘要】 利用直流磁控溅射技术制备了三元BCN薄膜,通过在100~500 mA之间调节励磁线圈电流,获得了不同成分的BCN薄膜。分析结果表明随着励磁线圈电流的增加,薄膜中B含量由43 at%上升至53 at%,C含量由25 at%下降至15 at%,而N原子百分含量基本不随励磁线圈电流的改变而变化。随着B含量不断增加,C含量不断减少,薄膜中B-C键含量逐渐减少,而B-N键含量相应增加,并且薄膜中类BC3.4的B-C键逐渐向类B4C的B-C键转化。薄膜中B和C含量的变化对薄膜的力学性能影响不明显,薄膜纳米硬度位于17.0~20.4 GPa之间,弹性模量位于161.0~197.3 GPa之间。更多还原

【Abstract】 Boron carbon nitride(BCN) films were deposited by dc magnetron sputtering technology.The films with various compositions were obtained by changing coil currents from 100-500 mA.The results indicated that B content increases from 43 at% to 53 at% as C content decreased from 25 at% to 15 at%,and N content keeped invariant as the coil currents increasing.As the increasing of B content and the decreasing of C content,the content of B-C bonding in the films decreases,the content of B-N bonding increases,and the kind of B-C bonding transforms from like BC3.4 to like B4C.The effect of B and C contents on mechanical properties of BCN films is not obrious,and the nano-hardness of films is within 17.0-20.4 GPa,and the elastil modulus of films is within 161.0-197.3 GPa.更多还原