【摘要】 采用电子束蒸发在硅衬底上制备TiO2薄膜,并在氧气氛下进行退火处理。分别使用X射线衍射仪和椭圆偏振仪分析退火前后以及不同退火温度下薄膜样品的结构、成分和折射率,研究氧气氛下进行退火对薄膜结构、成分和折射率的影响。结果表明:氧气氛下退火能够有效地改善薄膜缺氧的问题,提高TiO2薄膜的质量。更多还原

【Abstract】 TiO2 films were prepared on silicon substrate by electron beam evaporation,and then annealed in O2 atmosphere.The structures,composition and refractive index of TiO2 films as-deposited and annealed at different temperature in O2 atmosphere were studied with XRD and ellipsometry respectively.The effect of annealing in O2 atmosphere on the structures,composition and refractive index of TiO2 films were also studied.The results show that annealing in O2 atmosphere can resolve efficiently anoxic problem and improve the quality of the TiO2 films prepared by electron beam evaporation.更多还原