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“自下而上”法修补含缺陷的钯膜

Repair of defects in Pd composite membranes by bottom-up electroless filling

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【作者】 袁立祥徐恒泳

【Author】 YUAN Lixiang1,2,XU Hengyong2(1.Graduate University of the Chinese Academy of Sciences,Beijing 100049,China;2.Dalian Institute of Chemical physics,the Chinese Academy of Sciences,Dalian 116023,China)

【机构】 中国科学院研究生院中国科学院大连化学物理研究所

【摘要】 通过在化学镀镀液中添加长链巯基有机物(2-巯基苯并噻唑),利用巯基与金属钯强烈吸附的性质,使其吸附在钯膜表面,这样钯的自催化沉积仅仅发生在缺陷内部而不发生在钯膜表面,从而对含有缺陷的钯膜进行修补.对于选择性分别为720和4的M1和M2两根复合钯膜管,经过多次修补后,选择性S分别提高到2 556和3 990.经过SEM(EDS)和XRD的分析,修补过后的钯膜表面未见硫化物、碳化物等杂质的存在和表面缺陷的存在.结果表明这种自下而上修补法是可行的.

【Abstract】 The Pd composite membranes containing defects were repaired by electroless plating with addition of 2-mercaptobenzothiazole(MBT).MBT could inhibit the electroless Pd plating on the Pd membrane surface,not in the small defect hole.The ideal H2/N2 selectivity of M1,S,increased from 720 to 2 556 and that of M2 increased from 4 to 3 990 after repairing by this method.The surface of M2 was characterized by SEM(EDS) and XRD.There was no sulfide,carbide and defect on the surface after repairing.

  • 【文献出处】 膜科学与技术 ,Membrane Science and Technology , 编辑部邮箱 ,2009年03期
  • 【分类号】O484
  • 【被引频次】3
  • 【下载频次】103
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