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PJFET与双极兼容工艺技术研究

Study on PJFET-Bipolar Compatible Process Technology

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【作者】 税国华唐昭焕刘勇欧宏旗杨永晖王学毅黄磊

【Author】 SHUI Guohua1,TANG Zhaohuan1,LIU Yong1,2,OU Hongqi1,2,YANG Yonghui1,2,WANG Xueyi1,HUANG Lei1(1.Sichuan Institute of Solid State Circuits,CETC,Chongqing 400060;2.National Laboratory of Analog ICs,Chongqing 400060,P.R.China)

【机构】 中国电子科技集团公司第二十四研究所模拟集成电路国家级重点实验室

【摘要】 通过对PJFET与双极兼容工艺技术的研究,解决了PJFET和双极兼容工艺中的技术难点,得到了IDSS=150~350μA(W/L=10∶1)、VP=0.8~1.2 V、IGSS=10-12~10-11A的高性能PJFET和β=100~250、BVCEO≥36 V、Va≥100 V的NPN管。采用该技术,成功研制出一种偏置电流小于100 pA的高精密双极结型场效应晶体管(BJFET)集成运算放大器,获得了良好的效果。

【Abstract】 An investigation was made on PJFET-bipolar compatible process technology,and solutions to technical problems associated with the compatible process were found.Using this process,high-performance PJFET with IDSS = 150-350 μA(W/L = 10∶1),VP = 0.8-1.2 V,and IGSS= 10-12-10-11 A,and NPN transistor with β =100-250,BVCEO ≥ 36 V,and Va ≥ 100 V were realized.And based on bipolar junction field effect transistor(BJFET),a high-precision integrated operational amplifier with bias current below 100 pA was developed.

  • 【分类号】TN722.75
  • 【被引频次】3
  • 【下载频次】69
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