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离子束刻蚀HgCdTe环孔pn结Ⅰ-Ⅴ、R_D-V特性的研究(上)
Study ofⅠ-Ⅴand R_D-V Characteristics of Ion Beam Milling HgCdTe Loophole pn Junction
【摘要】 本文推导了一种可简便、准确、直观计算和分析pn结Ⅰ-Ⅴ特性的公式和方法,并应用该方法对两类典型HgCdTe环孔pn结的Ⅰ-Ⅴ、R_D-V特性进行了计算和拟合;得到了表面欧姆(反型沟道)漏电导、二极管理想因子n随电压的分布等反映二极管结特性的重要参数。计算结果表明,对于长波HgCdTe光伏器件而言,表面漏电流在整个暗电流中所占的比重相当大,表面漏电流严重地制约着器件性能。HgCdTe材料的晶体缺陷会使二极管的理想因子n增大,从而使产生-复合电流及陷阱辅助隧穿电流增加。
【Abstract】 In this paper,a simple,accurate and intuitionistic formula and method for calculating and analyzing theⅠ-Ⅴcharacteristics of a pn junction is deduced.The method is used to calculate and analyze theⅠ-Ⅴand R_D-V characteristics of two typical HgCdTe loophole junctions.Some important parameters which reflect the characteristics of a diode,such as surface Ohm leakage conductance and the distribution of the ideal factor n with voltage are obtained.The calculation result shows that for a long wavelength HgCdTe photovoltaic device,the surface leakage current accounts for a significantly large amount of the total dark current and imposes a severe restriction on the performance of the device. Due to the crystal defect in HgCdTe material,the ideal factor n of the diode can be increased and hence both the generation-recombination current and the trap-assisted tunneling current can be increased.
【Key words】 HgCdTe; ion beam milling; loophole pn junction; Ⅰ-Ⅴcharacteristic; dynamic resistance; surface leakage current;
- 【文献出处】 红外 ,Infrared , 编辑部邮箱 ,2009年01期
- 【分类号】TN215
- 【被引频次】3
- 【下载频次】127